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Proceedings Paper

Run time scanner data analysis for HVM lithography process monitoring and stability control
Author(s): Woong Jae Chung; Young Ki Kim; John Tristan; Jeong Soo Kim; Lokesh Subramany; Chen Li; Brent Riggs; Vidya Ramanathan; Ram Karur-Shanmugam; George Hoo; Jie Gao; Anna Golotsvan; Kevin Huang; Bill Pierson; John Robinson
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Paper Abstract

There are various data mining and analysis tools in use by high-volume semiconductor manufacturers throughout the industry that seek to provide robust monitoring and analysis capabilities for the purpose of maintaining a stable lithography process. These tools exist in both online and offline formats and draw upon data from various sources for monitoring and analysis. This paper explores several possible use cases of run-time scanner data to provide advanced overlay and imaging analysis for scanner lithography signatures. Here we demonstrate several use-cases for analyzing and stabilizing lithography processes. Applications include high order wafer alignment simulations in which an optimal alignment strategy is determined by dynamic wafer selection, reporting statistics data and analysis of the lot report and the sub-recipe as a sort of non-standard lot report, visualization of key lithography process parameters, and scanner fleet management (SFM)

Paper Details

Date Published: 14 April 2014
PDF: 8 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90502J (14 April 2014); doi: 10.1117/12.2046330
Show Author Affiliations
Woong Jae Chung, GLOBALFOUNDRIES Inc. (United States)
Young Ki Kim, GLOBALFOUNDRIES Inc. (United States)
John Tristan, GLOBALFOUNDRIES Inc. (United States)
Jeong Soo Kim, GLOBALFOUNDRIES Inc. (United States)
Lokesh Subramany, GLOBALFOUNDRIES Inc. (United States)
Chen Li, GLOBALFOUNDRIES Inc. (United States)
Brent Riggs, KLA-Tencor Corp. (United States)
Vidya Ramanathan, KLA-Tencor Corp. (United States)
Ram Karur-Shanmugam, KLA-Tencor Corp. (United States)
George Hoo, KLA-Tencor Corp. (United States)
Jie Gao, KLA-Tencor Corp. (United States)
Anna Golotsvan, KLA-Tencor Corp. (United States)
Kevin Huang, KLA-Tencor Corp. (United States)
Bill Pierson, KLA-Tencor Corp. (United States)
John Robinson, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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