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Proceedings Paper

Improvements of self-assembly properties via homopolymer addition or block-copolymer blends
Author(s): X. Chevalier; C. Nicolet; R. Tiron; Ahmed Gharbi; M. Argoud; C. Couderc; Guillaume Fleury; G. Hadziioannou; I. Iliopoulos; C. Navarro
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Paper Abstract

The properties of cylindrical poly(styrene-b-methylmethacrylate) (PS-b-PMMA) BCPs self-assembly in thinfilms are studied when the pure BCPs are blended either with a homopolymer or with another cylindrical PS-b-PMMA based BCP. For both of these approaches, we show that the period of the self-assembled features can be easily tuned and controlled, and that the final material presents interesting characteristics, such as the possibility to achieve thicker defects-free films, as compared to pure block-copolymers having the same period. Moreover, a statistical defectivity study based on a Delaunay triangulation and Voronoi analysis of the self-assemblies made with the different blends is described, and prove that despite their high value of polydispersity index, these blends exhibit also improved selfassembly properties (bigger monocrystalline arrangements and enhanced kinetics of defects annihilation) as compared to pure and monodisperse block-copolymers. Finally, the behavior of the blends is also compared to the ones their pure counter-part in templated approach like the contact-hole shrink to evaluate their respective process-window and response toward this physical constrain for lithographic applications.

Paper Details

Date Published: 28 March 2014
PDF: 13 pages
Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90490T (28 March 2014); doi: 10.1117/12.2046329
Show Author Affiliations
X. Chevalier, Arkema S.A. (France)
C. Nicolet, Arkema S.A. (France)
R. Tiron, CEA-LETI (France)
Ahmed Gharbi, CEA-LETI (France)
M. Argoud, CEA-LETI (France)
C. Couderc, CEA-LETI (France)
Guillaume Fleury, LCPO, CNRS, Univ. Bordeaux 1 (France)
G. Hadziioannou, LCPO, CNRS, Univ. Bordeaux 1 (France)
I. Iliopoulos, Arkema S.A. (France)
C. Navarro, Arkema S.A. (France)

Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)

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