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Proceedings Paper

New inspection technology for observing nanometer size defects using expansion soft template
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Paper Abstract

For sub-10nm lithography for semiconductor devices, inspection technologies for detecting nanometer size defects become quite important. In the case of optical inspection, it is difficult to detect a defect whose size is less than 23nm because of optical resolution limit. This paper describes a cost-effective inspection technology for detecting a nanometer size defect with the optical inspection technology using replicated soft template which is able to enlarge a defect size by expanding. Feasibility of detecting 9.6nm defect with optical inspection is reported.

Paper Details

Date Published: 2 April 2014
PDF: 5 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90501A (2 April 2014); doi: 10.1117/12.2046326
Show Author Affiliations
Seiji Morita, Toshiba Corp. (Japan)
Ryoji Yoshikawa, Toshiba Corp. (Japan)
Takashi Hirano, Toshiba Corp. (Japan)
Tatsuhiko Higashiki, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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