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Proceedings Paper

Further investigations of bottom-up/top-down lithography using vertically assembled block brush polymers
Author(s): Peter Trefonas; James W. Thackeray; Guorong Sun; Sangho Cho; Corrie Clark; Fan Yang; Stanislav V. Verkhoturov; Emile A. Schweikert; Karen L. Wooley
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Paper Details

Date Published:
Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90510C; doi: 10.1117/12.2046319
Show Author Affiliations
Peter Trefonas, Dow Electronic Materials (United States)
James W. Thackeray, Dow Electronic Materials (United States)
Guorong Sun, Texas A&M Univ. (United States)
Sangho Cho, Texas A&M Univ. (United States)
Corrie Clark, Texas A&M Univ. (United States)
Fan Yang, Texas A&M Univ. (United States)
Stanislav V. Verkhoturov, Texas A&M Univ. (United States)
Emile A. Schweikert, Texas A&M Univ. (United States)
Karen L. Wooley, Texas A&M Univ. (United States)

Published in SPIE Proceedings Vol. 9051:
Advances in Patterning Materials and Processes XXXI
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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