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Proceedings Paper

Illumination system without scanning slit for lithographic tools
Author(s): Yunbo Zhang; Aijun Zeng; Ying Wang; Mingxing Chen; Shanhua Zhang; Qiao Yuan; Huijie Huang
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Paper Abstract

The step-and-scan lithographic illumination system has a scanning slit which could not only control the exposure field size but also assist the wafer to complete scanning process with high uniformity. The scanning slit is comprised by four blades which are drive by four electric actuators. This paper presents a 193nm lithographic illumination system without utilizing scanning slit. A microlens array, a micromirror array and a collimating lens are used to generated a certain intensity distribution on the surface of the aperture array. A fast scanning mirror is used in to change the position of the formed intensity distribution to change the illuniated area on the mask. That can realize lithographic scanning process without slit.

Paper Details

Date Published: 31 March 2014
PDF: 5 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 90522H (31 March 2014); doi: 10.1117/12.2046303
Show Author Affiliations
Yunbo Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Aijun Zeng, Shanghai Institute of Optics and Fine Mechanics (China)
Ying Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Mingxing Chen, Shanghai Institute of Optics and Fine Mechanics (China)
Shanhua Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Qiao Yuan, Shanghai Institute of Optics and Fine Mechanics (China)
Huijie Huang, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)

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