Share Email Print
cover

Proceedings Paper

Improved measurement capabilities at the NIST EUV reflectometry facility
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The NIST Extreme Ultraviolet (EUV) Reflectometry Facility was designed in the 1990s to accommodate the largest multilayer optics envisioned at that time. However, with increasing power requirements for an EUV scanner, source collection optics have grown larger and more steeply curved than the original design would allow. To accommodate these changes, the mechanical and operational parameters of the facility have been upgraded. To access the entire surface of a larger optic, an auxiliary off-axis rotation stage has been installed allowing an increase in maximum optic size from 350 mm to 450 mm. Likewise, to deal with the deeper sags and steeper slopes of these optics, we have had to significantly expand our data analysis capabilities. In order to make these measurements, the incident radiation is reflected out of the vertical plane, allowing for measurements of effectively unpolarized radiation, an advantage for EUV lithography optics such as source collectors.

Paper Details

Date Published: 17 April 2014
PDF: 8 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90481I (17 April 2014); doi: 10.1117/12.2046290
Show Author Affiliations
C. Tarrio, National Institute of Standards and Technology (United States)
S. Grantham, National Institute of Standards and Technology (United States)
T. A. Germer, National Institute of Standards and Technology (United States)
J. Rife, National Institute of Standards and Technology (United States)
T. B. Lucatorto, National Institute of Standards and Technology (United States)
M. Kriese, Rigaku Innovative Technologies, Inc. (United States)
Y. Platonov, Rigaku Innovative Technologies, Inc. (United States)
L. Jiang, Rigaku Innovative Technologies, Inc. (United States)
J. Rodriguez, Rigaku Innovative Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood; Eric M. Panning, Editor(s)

© SPIE. Terms of Use
Back to Top