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Proceedings Paper

Macroscopic exploration and visual quality inspection of thin film deposit
Author(s): Simon-Frédéric Désage; Gilles Pitard; Hugues Favrelière; Maurice Pillet; Olivier Dellea; Pascal Fugier; Philippe Coronel; Emmanuel Ollier
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Paper Abstract

Micro/nanotechnologies evolve causing an evolution of surface characterization systems of thin films. Today, these systems are not adapted to the future needs (or current) to characterize and qualify a large effective area within industrial production. This concerns the thin film active layers or simple mask for structuring the surface. This paper proposes a quality control method for thin films of self-assembled particles and high quality. This method is founded on the intersection of several skills available in our laboratories: Industrial process of visual inspection, optical methods for quality control (large area relative to the state of the art) and advances in micro/nanotechnology (CEA/Liten).

Paper Details

Date Published: 2 April 2014
PDF: 9 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90502G (2 April 2014); doi: 10.1117/12.2046246
Show Author Affiliations
Simon-Frédéric Désage, Univ. de Savoie (France)
Gilles Pitard, Univ. de Savoie (France)
Hugues Favrelière, Univ. de Savoie (France)
Maurice Pillet, Univ. de Savoie (France)
Olivier Dellea, CEA-Liten (France)
Pascal Fugier, CEA-Liten (France)
Philippe Coronel, CEA-Liten (France)
Emmanuel Ollier, CEA-Liten (France)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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