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Proceedings Paper

Focus control budget analysis for critical layers of flash devices
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Paper Abstract

As design rule shrinks down, on-product focus control became more important since available depth of focus (DOF) is getting narrower and also required critical dimension uniformity (CDU) becomes tighter. Thus monitoring, control the scanner focus error and reducing the focus control budget of scanner are essential for the production. There are some critical layers which has so narrow DOF margin that hardly be processed on old model scanners. Our study mainly focused on the analysis of the scanner focus control budget of such layers. Among the contributors to the focus budget, inter-field focus uniformity was turned out to be the most dominant. Leveling accuracy and intra-field focus uniformity were also dominant.

Paper Details

Date Published: 2 April 2014
PDF: 7 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90502F (2 April 2014); doi: 10.1117/12.2046235
Show Author Affiliations
Jong Hoon Jang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Tony Park, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Kyeong Dong Park, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jong Hyun Hwang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jin Phil Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Young Seog Kang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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