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Proceedings Paper • Open Access

A novel concept for actinic EUV mask review tool using a scanning lensless imaging method at the Swiss Light Source (Withdrawal Notice)

Paper Abstract

Publisher's Note: This paper, originally published on April 17, 2014, was withdrawn at the author's request on May 25, 2016.

Paper Details

Date Published: 17 April 2014
PDF: 1 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 904811 (17 April 2014); doi: 10.1117/12.2046226
Show Author Affiliations
Sangsul Lee, Paul Scherrer Institut (Switzerland)
Manuel Guizar-Sicairos, Paul Scherrer Institut (Switzerland)
Yasin Ekinci, Paul Scherrer Institut (Switzerland)

Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood; Eric M. Panning, Editor(s)

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