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Proceedings Paper

Chiral nanomaterial fabrication by means of on-edge lithography
Author(s): Kay Dietrich; Dennis Lehr; Oliver Puffky; Ernst-Bernhard Kley; Andreas Tünnermann
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Paper Abstract

We present an approach named on-edge lithography, where chiral shaped pattern are yield through the combination of electron beam lithography in variable shape or cell projection mode and shadow evaporation. On one hand, we describe the process and reveal advantages when opposed to other common nano fabrication techniques. On the other hand, we also figure out challenges for successful technological application. Finally we demonstrate the useability of the process by revealing SEM pictures of a couple of realized chiral nanostructures. In order to evaluate the process we further present optical measurements. We find peak values of circular dichroism of 44% at 420 THz (715 nm). The process is applicable on large scale and to the fullest compatible with other nano-lithographic tools e.g. nanoimprint replication techniques, thus pushing chiral nanomaterial fabrication towards highest efficiency.

Paper Details

Date Published: 27 March 2014
PDF: 6 pages
Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90510D (27 March 2014); doi: 10.1117/12.2046214
Show Author Affiliations
Kay Dietrich, Friedrich-Schiller-Univ. Jena (Germany)
Dennis Lehr, Friedrich-Schiller-Univ. Jena (Germany)
Oliver Puffky, Friedrich-Schiller-Univ. Jena (Germany)
Ernst-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)
Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Andreas Tünnermann, Friedrich-Schiller-Univ. Jena (Germany)
Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 9051:
Advances in Patterning Materials and Processes XXXI
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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