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Proceedings Paper

Yield-aware decomposition for LELE double patterning
Author(s): Yukihide Kohira; Yoko Yokoyama; Chikaaki Kodama; Atsushi Takahashi; Shigeki Nojima; Satoshi Tanaka
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Paper Abstract

In this paper, we propose a fast layout decomposition algorithm in litho-etch-litho-etch (LELE) type double patterning considering the yield. Our proposed algorithm extracts stitch candidates properly from complex layouts including various patterns, line widths and pitches. The planarity of the conflict graph and independence of stitch-candidates are utilized to obtain a layout decomposition with minimum cost efficiently for higher yield. The validity of our proposed algorithm is confirmed by using benchmark layout patterns used in literatures as well as layout patterns generated to fit the target manufacturing technologies as much as possible. In our experiments, our proposed algorithm is 7.7 times faster than an existing method on average.

Paper Details

Date Published: 28 March 2014
PDF: 10 pages
Proc. SPIE 9053, Design-Process-Technology Co-optimization for Manufacturability VIII, 90530T (28 March 2014); doi: 10.1117/12.2046180
Show Author Affiliations
Yukihide Kohira, The Univ. of Aizu (Japan)
Yoko Yokoyama, Toshiba Corp. (Japan)
Chikaaki Kodama, Toshiba Corp. (Japan)
Atsushi Takahashi, Tokyo Institute of Technology (Japan)
Shigeki Nojima, Toshiba Corp. (Japan)
Satoshi Tanaka, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 9053:
Design-Process-Technology Co-optimization for Manufacturability VIII
John L. Sturtevant; Luigi Capodieci, Editor(s)

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