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Proceedings Paper

Defect-aware process margin for chemo-epitaxial directed self-assembly lithography using simulation method based on self-consistent field theory
Author(s): Katsuyoshi Kodera; Hironobu Sato; Hideki Kanai; Yuriko Seino; Naoko Kihara; Yusuke Kasahara; Katsutoshi Kobayashi; Ken Miyagi; Shinya Minegishi; Koichi Yatsuda; Tomoharu Fujiwara; Noriyuki Hirayanagi; Yoshiaki Kawamonzen; Tsukasa Azuma
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Paper Abstract

We proposed a new concept of “defect-aware process margin.” Defect-aware process margin was evaluated by investigating the energy difference between the free-energy of the most stable state and that of the first metastable state. The energy difference is strongly related to the defect density in DSA process. As a result of our rigorous simulations, the process margin of the pinning layer width was found to be: (1) worse when the pinning layer affinity is too large, (2) better when the background affinity has the opposite sign of the pinning layer affinity, and (3) better when the top of the background layer is higher than that of the pinning layer by 0.1L0.

Paper Details

Date Published: 28 March 2014
PDF: 8 pages
Proc. SPIE 9049, Alternative Lithographic Technologies VI, 904926 (28 March 2014); doi: 10.1117/12.2046159
Show Author Affiliations
Katsuyoshi Kodera, EUVL Infrastructure Development Ctr., Inc. (Japan)
Hironobu Sato, EUVL Infrastructure Development Ctr., Inc. (Japan)
Hideki Kanai, EUVL Infrastructure Development Ctr., Inc. (Japan)
Yuriko Seino, EUVL Infrastructure Development Ctr., Inc. (Japan)
Naoko Kihara, EUVL Infrastructure Development Ctr., Inc. (Japan)
Yusuke Kasahara, EUVL Infrastructure Development Ctr., Inc. (Japan)
Katsutoshi Kobayashi, EUVL Infrastructure Development Ctr., Inc. (Japan)
Ken Miyagi, EUVL Infrastructure Development Ctr., Inc. (Japan)
Shinya Minegishi, EUVL Infrastructure Development Ctr., Inc. (Japan)
Koichi Yatsuda, EUVL Infrastructure Development Ctr., Inc. (Japan)
Tomoharu Fujiwara, EUVL Infrastructure Development Ctr., Inc. (Japan)
Noriyuki Hirayanagi, EUVL Infrastructure Development Ctr., Inc. (Japan)
Yoshiaki Kawamonzen, EUVL Infrastructure Development Ctr., Inc. (Japan)
Tsukasa Azuma, EUVL Infrastructure Development Ctr., Inc. (Japan)


Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)

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