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Proceedings Paper

Repetitive operation of counter-facing plasma focus device: toward a practical light source for EUV lithography
Author(s): Tatsuya Sodekoda; Hajime Kuwabara; Masashi Masuda; Shijia Liu; Kouki Kanou; Kenta Kawaguchi; Kazuhiko Horioka
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Paper Abstract

In this paper, the latest advances in the field of extreme ultra violet (EUV) light sources for application in counter-facing plasma focus devices are presented. EUV emission, plasma and electrical properties under two pulses operation are reported. Using this new plasma focus system, the total amount of supply material and the energy cost of the plasma source could be reduced. The physical behavior during a two-pulse experiment with a high repetition rate (1 kHz) is explained. Continuous operation for future practical use in advanced lithography systems is also investigated.

Paper Details

Date Published: 17 April 2014
PDF: 8 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 904824 (17 April 2014); doi: 10.1117/12.2046149
Show Author Affiliations
Tatsuya Sodekoda, IHI Corp. (Japan)
Hajime Kuwabara, IHI Corp. (Japan)
Masashi Masuda, Tokyo Institute of Technology (Japan)
Shijia Liu, Tokyo Institute of Technology (Japan)
Kouki Kanou, Tokyo Institute of Technology (Japan)
Kenta Kawaguchi, Tokyo Institute of Technology (Japan)
Kazuhiko Horioka, Tokyo Institute of Technology (Japan)

Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood; Eric M. Panning, Editor(s)

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