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Proceedings Paper

Decomposition-aware layout optimization for 20/14nm standard cells
Author(s): Lynn T. -N. Wang; Sriram Madhavan; Shobhit Malik; Eric Chiu; Luigi Capodieci
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Paper Abstract

Decomposition-aware layout design improvements for 8, 9, 11, and 13-track 20/14nm standard cells are presented. Using a decomposition-aware scoring methodology that quantifies the manufacturability of layouts, the Double Patterning Technology (DPT)-compliant layouts are optimized for DPT-specific metrics that include: the density difference between the two decomposition mask layers, the enclosure of stitching areas, the density of stitches, and the design regularity of stitching areas. For a 9-track standard cell, eliminating the stitches from the layout design improved the composite score from 0.53 to 0.70.

Paper Details

Date Published: 28 March 2014
PDF: 9 pages
Proc. SPIE 9053, Design-Process-Technology Co-optimization for Manufacturability VIII, 90530W (28 March 2014); doi: 10.1117/12.2046147
Show Author Affiliations
Lynn T. -N. Wang, GLOBALFOUNDRIES Inc. (United States)
Sriram Madhavan, GLOBALFOUNDRIES Inc. (United States)
Shobhit Malik, GLOBALFOUNDRIES Inc. (United States)
Eric Chiu, GLOBALFOUNDRIES Inc. (United States)
Luigi Capodieci, GLOBALFOUNDRIES Inc. (United States)


Published in SPIE Proceedings Vol. 9053:
Design-Process-Technology Co-optimization for Manufacturability VIII
John L. Sturtevant; Luigi Capodieci, Editor(s)

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