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Proceedings Paper

UV-LED exposure system for low-cost photolithography
Author(s): Murat Kaya Yapici; Ilyas Farhat
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Paper Abstract

This paper reports the development of a low-cost, portable, light-emitting diode (LED)-based UV exposure system for photolithography. The major system components include UV-LEDs, microcontroller, digital-to-analog (D/A) converter and LED control circuitry. The UV-LED lithography system is also equipped with a digital user interface (LCD and keypad) and permits accurate electronic control on the exposure time and power. Hence the exposure dose can be varied depending on process requirements. Compared to traditional contact lithography, the UV-LED lithography system is significantly cheaper, simple to construct using off-the shelf components and does not require complex infrastructure to operate. Such reduction in system cost and complexity renders UV-LED lithography as a perfect candidate for micro lithography with large process windows typically suitable for MEMS, microfluidics applications.

Paper Details

Date Published: 31 March 2014
PDF: 7 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 90521T (31 March 2014); doi: 10.1117/12.2046123
Show Author Affiliations
Murat Kaya Yapici, Khalifa Univ. of Science, Technology and Research (United Arab Emirates)
Ilyas Farhat, Khalifa Univ. of Science, Technology and Research (United Arab Emirates)


Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)

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