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Proceedings Paper

Characterization of 1D layout technology at advanced nodes and low k1
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Paper Abstract

Highly regular gridded designs have been generally accepted1 as a key component for continued advances in lithographic resolution in an era of limited further progress in lithography hardware. With a given process technology tool set, higher pattern density (lower k1) and quality are achieved using gridded design rules (GDR) in comparison to conventional 2D designs. GDR is necessary for designs with k1 approaching the theoretical Rayleigh limit ~ 0:25. High pattern densities (fine pitch) and good image quality and manufacturability are achieved by very regular designs Fig. 1, which avoid complex corner structures and pattern density variations typical for conventional 2D designs. In particular lines+cuts implementations of GDR are well-suited for pitch splitting and multiple patterning, where the critical cuts patterns can be easily separated into groups with larger pitch for separate patterning. Very advanced technology nodes thus become possible with conventional lithography technology, see2 for 11nm results.

Paper Details

Date Published: 31 March 2014
PDF: 8 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 905213 (31 March 2014); doi: 10.1117/12.2046120
Show Author Affiliations
V. Axelrad, Sequoia Design Systems, Inc. (United States)
K. Mikami, Canon Inc. (Japan)
M. Smayling, Tela Innovations, Inc. (United States)
K. Tsujita, Canon Inc. (Japan)
H. Yaegashi, Tokyo Electron Ltd. (Japan)

Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)

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