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Proceedings Paper

Decreasing curing temperature of spin-on dielectrics by using additives
Author(s): Jin Hee Bae; Kwen Woo Han; Eun Su Park; Hui Chan Yoon; Yoong Hee Na; Jin Woo Seo; Wan Hee Lim; Bo Sun Kim; Jun Young Jang; Younjin Cho
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Paper Abstract

Spin-on dielectric (SOD) is widely used in semiconductor industry, to form insulating layers including shallow trench isolation (STI) or inter-layer dielectrics (ILD). SOD has several advantages over high density plasma chemical vapor deposition (HDP-CVD) for manufacturing process, such as less defect and higher throughput. However, both SOD and HDP-CVD have a drawback, which is a high temperature curing process required to make pure silicon oxide layers. High temperature curing could cause high stress and thermal distortion. These disadvantages are becoming more problematic as the semiconductor device shrinks. To resolve the problem, we tested several additives to moderate the curing temperature. It was found out that amine compounds were effective to convert SOD polymer into silicon oxide, therefore the curing process could be performed at a lower temperature. We also observed that the SOD films containing amine additives have higher etch resistance during a wet etch process. These results, as well as the lower curing temperature, are beneficial for manufacturing insulating layers. Further investigation is ongoing to characterize other film properties of the SOD with additives, and to optimize the formulation conditions according to the requirements of manufacturing processes.

Paper Details

Date Published: 27 March 2014
PDF: 5 pages
Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 90511R (27 March 2014); doi: 10.1117/12.2046098
Show Author Affiliations
Jin Hee Bae, Cheil Industries Inc. (Korea, Republic of)
Kwen Woo Han, Cheil Industries Inc. (Korea, Republic of)
Eun Su Park, Cheil Industries Inc. (Korea, Republic of)
Hui Chan Yoon, Cheil Industries Inc. (Korea, Republic of)
Yoong Hee Na, Cheil Industries Inc. (Korea, Republic of)
Jin Woo Seo, Cheil Industries Inc. (Korea, Republic of)
Wan Hee Lim, Cheil Industries Inc. (Korea, Republic of)
Bo Sun Kim, Cheil Industries Inc. (Korea, Republic of)
Jun Young Jang, Cheil Industries Inc. (Korea, Republic of)
Younjin Cho, Cheil Industries Inc. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9051:
Advances in Patterning Materials and Processes XXXI
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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