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Proceedings Paper

Demonstration of EDA flow for massively parallel e-beam lithography
Author(s): P. Brandt; J. Belledent; C. Tranquillin; T. Figueiro; S. Meunier; S. Bayle; A. Fay; M. Milléquant; B. Icard; M. Wieland
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Paper Abstract

Today’s soaring complexity in pushing the limits of 193nm immersion lithography drives the development of other technologies. One of these alternatives is mask-less massively parallel electron beam lithography, (MP-EBL), a promising candidate in which future resolution needs can be fulfilled at competitive cost. MAPPER Lithography’s MATRIX MP-EBL platform has currently entered an advanced stage of development. The first tool in this platform, the FLX 1200, will operate using more than 1,300 beams, each one writing a stripe 2.2μm wide. 0.2μm overlap from stripe to stripe is allocated for stitching. Each beam is composed of 49 individual sub-beams that can be blanked independently in order to write in a raster scan pixels onto the wafer.

Paper Details

Date Published: 28 March 2014
PDF: 17 pages
Proc. SPIE 9049, Alternative Lithographic Technologies VI, 904915 (28 March 2014); doi: 10.1117/12.2046091
Show Author Affiliations
P. Brandt, MAPPER Lithography (Netherlands)
J. Belledent, CEA-LETI (France)
C. Tranquillin, Aselta Nanographics (France)
T. Figueiro, Aselta Nanographics (France)
S. Meunier, CEA-LETI (France)
S. Bayle, Aselta Nanographics (France)
A. Fay, CEA-LETI (France)
M. Milléquant, Aselta Nanographics (France)
B. Icard, CEA-LETI (France)
M. Wieland, MAPPER Lithography (Netherlands)


Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)

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