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Proceedings Paper

Simulations of spatial DSA morphology, DSA-aware assist features and block copolymer-homopolymer blends
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Paper Abstract

Further enhancements to Monte Carlo and Self-Consistent Field Theory Directed Self-Assembly (DSA) simulation capabilities implemented in GLOBALFOUNDRIES are presented and discussed, along with the results of their applications. We present the simulation studies of DSA in graphoepitaxy confinement wells, where the DSA process parameters are varied in order to determine the optimal set of parameters resulting in a robust and etch transferrable phase morphology. A novel concept of DSA-aware assist features for the optical lithography process is presented and demonstrated in simulations. The results of the DSA simulations and studies for the DSA process using a blend of homopolymers and diblock copolymers are also presented and compared with the simulated diblock copolymer systems.

Paper Details

Date Published: 28 March 2014
PDF: 10 pages
Proc. SPIE 9049, Alternative Lithographic Technologies VI, 904908 (28 March 2014); doi: 10.1117/12.2046082
Show Author Affiliations
Azat Latypov, GLOBALFOUNDRIES Inc. (United States)
Tamer H. Coskun, GLOBALFOUNDRIES Inc. (United States)
Grant Garner, GLOBALFOUNDRIES Inc. (United States)
Moshe Preil, GLOBALFOUNDRIES Inc. (United States)
Gerard Schmid, GLOBALFOUNDRIES Inc. (United States)
Ji Xu, GLOBALFOUNDRIES Inc. (United States)
Yi Zou, GLOBALFOUNDRIES Inc. (United States)


Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)

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