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Proceedings Paper

A temperature control algorithm of immersion liquid for immersion lithography
Author(s): Junwei He; Xiaoping Li; Min Lei; Bing Chen; Jinchun Wang
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Paper Abstract

Immersion lithography is one of the main technologies used to manufacture integrated circuits with the shortest feature size. In immersion lithography, temperature of immersion liquid is strictly constrained and its allowable range is less than ±0.01°C at 22°C. To meet this requirement, a temperature control algorithm adopted by the test rig which controls the temperature of the immersion liquid with process cooling water (PCW) via heat exchangers is proposed. By adjusting the flow rate of PCW through the heat exchangers, the control system varies the amount of heat exchanged, and the temperature of the immersion liquid can be properly controlled. The temperature control rig is a multi-disturbed, timevariant, non-linear and time-delayed system and its transfer function varies with the inlet temperature and flow rates of the streams through the heat exchangers. Considering the characteristics of the system, a cascade-connected fuzzy PID feedback algorithm is designed.

Paper Details

Date Published: 31 March 2014
PDF: 7 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 90522F (31 March 2014); doi: 10.1117/12.2046080
Show Author Affiliations
Junwei He, Huazhong Univ. of Science and Technology (China)
Xiaoping Li, Huazhong Univ. of Science and Technology (China)
Min Lei, Huazhong Univ. of Science and Technology (China)
Bing Chen, Huazhong Univ. of Science and Technology (China)
Jinchun Wang, Huazhong Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)

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