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Proceedings Paper

Built-in lens mask lithography
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Paper Abstract

Cost effective micro lithography tool is demanded for fine micro devices. However, resolution of a conventional proximity exposure system is not sufficient below several micron feature size for deep focus depth. On the other hand, a reduction projection system is sufficient to resolve it but the cost of the tool is too much high compared to proximity exposure systems. To enhance the resolution of photolithography, there has been proposed a number of novel methods beside shorting of wave length. Some of them are utilized in current advanced lithography systems, for example, the immersion lithography1 enhances effective NA and the phase shift mask2 improves optical transmittance function. However, those advanced technology is mainly focused on improvement for advanced projection exposure systems for ultra-fine lithography. On the other hand, coherence holography pattering is recently proposed and expected for 3-dimentional pattering3-5. Also, Talbot lithography6-8 is studied for periodical micro and nano pattering. Those novels pattering are based on wave propagation due to optical diffraction without using expensive optical lens systems. In this paper we newly propose novel optical lithography using built-in lens mask to enhance resolution and focus depth in conventional proximity exposure system for micro lithographic application without lens systems. The performance is confirmed by simulation and experimental works.

Paper Details

Date Published: 31 March 2014
PDF: 6 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 90520I (31 March 2014); doi: 10.1117/12.2046060
Show Author Affiliations
Naoki Ueda, Osaka Prefecture Univ. (Japan)
Masaru Sasago, Osaka Prefecture Univ. (Japan)
Akio Misaka, Osaka Prefecture Univ. (Japan)
Hisao Kikuta, Osaka Prefecture Univ. (Japan)
Hiroaki Kawata, Osaka Prefecture Univ. (Japan)
Yoshihiko Hirai, Osaka Prefecture Univ. (Japan)

Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)

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