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Proceedings Paper

A stochastic approach to SRAF printing prediction
Author(s): Andrey Lutich
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Paper Abstract

In this paper we discuss a statistic approach to SRAF printing detection. This method considers and is generically based on the opportunistic essence of the resist image formation due to various stochastic uncertainties in the state-of-the-art advanced node lithographic process. The method is based on the direct measurement of the probability of SRAF printing at considered-to-be-nominal conditions and extrapolation of the results based on the process conditions/assumptions to the probability ranges where direct probability measurements are practically impossible. The method described here provides a controllable and quantitative framework for setting up SRAF printing detection and facilitates the significant reduction of the efforts and costs needed to setup SRAF printing checks. The argumentation and the way of looking at the verification setup in the environments with considerable variability can be directly reused to design and calibrate other checks in OPC verification flows.

Paper Details

Date Published: 31 March 2014
PDF: 8 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 905225 (31 March 2014); doi: 10.1117/12.2045897
Show Author Affiliations
Andrey Lutich, GLOBALFOUNDRIES Dresden (Germany)


Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)

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