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Proceedings Paper

Improving the accuracy of overlay measurements with calibration of wafer-induced shifts
Author(s): Wooseok Ko; Yusin Yang; Sangkil Lee; ChungSam Jun
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Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 905025; doi: 10.1117/12.2045862
Show Author Affiliations
Wooseok Ko, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Yusin Yang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sangkil Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
ChungSam Jun, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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