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Proceedings Paper

Novel wafer stepper with violet LED light source
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Paper Abstract

Novel wafer stepper by using contact or proximity printing will be developed, using violet LED light source to replace Hg Arc. lamp or laser. Mirror, filter and condenser lens for Hg Arc. Lamp or laser and reduction lens for projection printing can be discarded. Reliability and manufacturing cost of wafer stepper can be improved. Exposure result by using IP3600 resist and wafer stepper with violet LED light source (wave-length 360nm to 410 nm) will be obtained. This novel wafer stepper can be used for 3DIC, MEMS and bio-chip lithography application by using thin and thick resist with sub-micron to 100 micron thickness.

Paper Details

Date Published: 31 March 2014
PDF: 8 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 90522G (31 March 2014); doi: 10.1117/12.2045738
Show Author Affiliations
Yung-Chiang Ting, Far East Univ. (Taiwan)
Shyi-Long Shy, National Nano Device Labs. (Taiwan)


Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)

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