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Proceedings Paper

Emission properties of tin droplets laser-produced-plasma light sources
Author(s): Hong Chen; Xinbing Wang; Duluo Zuo; Peixiang Lu; Haihong Zhu; Tao Wu
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Paper Abstract

Laser produced plasma (LPP) light sources for extreme ultraviolet (EUV) lithography currently has been extensively studied. Most of the studies are based on CO2 laser induced plasma from mass limited tin targets. In this work, a droplet dispenser that produces uniform droplets size of about 150μm was established. A pulsed TEA-CO2 laser and a Nd: YAG laser irradiated the droplets producing plasma respectively to get EUV emission. An X-ray Spectrometer and EUV photodiodes were used to collect the spectra and EUV radiation. The different EUV spectral composition and angular distribution of EUV emission from plasmas induced by the CO2 and Nd: YAG laser were studied.

Paper Details

Date Published: 17 April 2014
PDF: 6 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90481V (17 April 2014); doi: 10.1117/12.2045732
Show Author Affiliations
Hong Chen, Huazhong Univ. of Science and Technology (China)
Xinbing Wang, Huazhong Univ. of Science and Technology (China)
Duluo Zuo, Huazhong Univ. of Science and Technology (China)
Peixiang Lu, Huazhong Univ. of Science and Technology (China)
Haihong Zhu, Huazhong Univ. of Science and Technology (China)
Tao Wu, Wuhan Institute of Technology (China)


Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood; Eric M. Panning, Editor(s)

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