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Proceedings Paper

Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL
Author(s): Takashi Sato; Masako Yamakawa; Yumi Ochiai; Yu Okada; Takashi Makinoshima; Masaaki Takasuka; Masatoshi Echigo
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Paper Abstract

In our previous paper, we reported the development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL. We also reported the EB patterning result showed the resist containing the new xanthendiol, 13-biphenyl-13H-benzoxanthen-3,10-diol, could resolve the 30 nm half-pitch pattern. In this paper, we report the resist containing the new xanthendiol could resolve the 20 nm half-pitch pattern without pattern collapse by optimizing formulation and conditions. Furthermore 15 nm half-pitch patterns were partially resolved. And the EUVL patterning result also shows 20 nm half-pitch pattern.

Paper Details

Date Published: 27 March 2014
PDF: 8 pages
Proc. SPIE 9051, Advances in Patterning Materials and Processes XXXI, 905121 (27 March 2014); doi: 10.1117/12.2045654
Show Author Affiliations
Takashi Sato, Mitsubishi Gas Chemical Co., Inc. (Japan)
Masako Yamakawa, Mitsubishi Gas Chemical Co., Inc. (Japan)
Yumi Ochiai, Mitsubishi Gas Chemical Co., Inc. (Japan)
Yu Okada, Mitsubishi Gas Chemical Co., Inc. (Japan)
Takashi Makinoshima, Mitsubishi Gas Chemical Co., Inc. (Japan)
Masaaki Takasuka, Mitsubishi Gas Chemical Co., Inc. (Japan)
Masatoshi Echigo, Mitsubishi Gas Chemical Co., Inc. (Japan)


Published in SPIE Proceedings Vol. 9051:
Advances in Patterning Materials and Processes XXXI
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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