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Proceedings Paper

Focused beam scatterometry for deep subwavelength metrology
Author(s): Thomas G. Brown; Miguel A. Alonso; Anthony Vella; Michael J. Theisen; Stephen T. Head; Steven R. Gillmer; Jonathan D. Ellis
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Paper Abstract

It is known that far-field scattered light requires a priori sample information in order to reconstruct nm-scale information such as is required in semiconductor metrology. We describe an approach to scatterometry that uses unconventional polarization states in the pupil of a high NA objective lens. We call this focused beam scatterometry; we will discuss the sensitivity limits to this approach and how it relates to micro-ellipsometry as well as low-NA scatterometry.

Paper Details

Date Published: 12 March 2014
PDF: 7 pages
Proc. SPIE 8949, Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI, 89490Y (12 March 2014); doi: 10.1117/12.2045651
Show Author Affiliations
Thomas G. Brown, Univ. of Rochester (United States)
Miguel A. Alonso, Univ. of Rochester (United States)
Anthony Vella, Univ. of Rochester (United States)
Michael J. Theisen, Univ. of Rochester (United States)
Stephen T. Head, Univ. of Rochester (United States)
Steven R. Gillmer, Univ. of Rochester (United States)
Jonathan D. Ellis, Univ. of Rochester (United States)


Published in SPIE Proceedings Vol. 8949:
Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXI
Thomas G. Brown; Carol J. Cogswell; Tony Wilson, Editor(s)

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