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Proceedings Paper

Ultraviolet curing nanoimprint green lithography using water-repellent film derived from biomass for solar cells devices
Author(s): Satoshi Takei; Kenta Ito; Gaku Murakami; Tsutomu Obata; Yoshiyuki Yokoyama; Kigenn Sugahara; Takumi Ichikawa; Wataru Mizuno; Junji Sumioka; Masayuki Fujii; Tetsuro Okada
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Paper Abstract

The design concepts of an ecofriendly water-repellent film using the sugar-related organic compounds with fluorinated alkyl group derived from biomass are demonstrated to avoid various kinds of nanoimprint material pattern peeling, defects, particles, and contaminants in ultraviolet curing nanoimprint lithography. Developed sugar-related organic compounds with three glucose derivatives with ultraviolet curable groups or fluorinated alkyl group derived from biomass produced high-quality imprint images of pillar patterns with a 230-300 nm diameter and height of 200-250 nm. The ecofriendly waterrepellent film as a functional biomass material was indicated to achieve the high water contact angle of 102°, low surface free energy of 22.1, suitable refractive index of 1.42-1.50, and high transparency at the wavelength of 350-700 nm.

Paper Details

Date Published: 14 May 2014
PDF: 10 pages
Proc. SPIE 9140, Photonics for Solar Energy Systems V, 91400V (14 May 2014); doi: 10.1117/12.2045640
Show Author Affiliations
Satoshi Takei, Toyama Prefectural Univ. (Japan)
Osaka Univ. (Japan)
Kenta Ito, Toyama Prefectural Univ. (Japan)
Gaku Murakami, Richell Corp. (Japan)
Tsutomu Obata, Toyama Industrial Technology Ctr. (Japan)
Yoshiyuki Yokoyama, Toyama Industrial Technology Ctr. (Japan)
Kigenn Sugahara, Toyama Prefectural Univ. (Japan)
Takumi Ichikawa, Toyama Prefectural Univ. (Japan)
Wataru Mizuno, Toyama Industrial Technology Ctr. (Japan)
Junji Sumioka, Toyama Industrial Technology Ctr. (Japan)
Masayuki Fujii, Richell Corp. (Japan)
Tetsuro Okada, Toyama Prefectural Plastic Industries Association (Japan)


Published in SPIE Proceedings Vol. 9140:
Photonics for Solar Energy Systems V
Ralf B. Wehrspohn; Andreas Gombert, Editor(s)

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