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Proceedings Paper

Approach of pullulan derivatives to resist polymers for green lithography in eco-friendly optical NEMS and MEMS
Author(s): Satoshi Takei; Akihiro Oshima; Kenta Ito; Kigenn Sugahara; Miki Kashiwakura; Tomoko G. Oyama; Takahiro Kozawa; Seiichi Tagawa; Makoto Hanabata
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Paper Abstract

This presentation reported an approach of glucose derivatives to resist polymers for eco-friendly optical NEMS and MEMS. The material design concept to use the water-soluble resist material with highly efficient crosslinking, water development, and lower film thickness shrinkage was proposed for green lithography. The lithographic properties due to the glucose derivatives, and the low film thickness shrinkage due to distinctive bulky chemical structure were proposed in the resist material, and then demonstrated to be effective for creating high resolution, excellent patterning dimensional accuracy, and low line edge roughness in EB lithography. Mixing or blending of glucose and cellulose derivatives was a valuable approach to the design of resist formulations for eco-friendly optical NEMS and MEMS.

Paper Details

Date Published: 2 May 2014
PDF: 11 pages
Proc. SPIE 9130, Micro-Optics 2014, 913011 (2 May 2014); doi: 10.1117/12.2045636
Show Author Affiliations
Satoshi Takei, Toyama Prefectural Univ. (Japan)
Osaka Univ. (Japan)
Akihiro Oshima, Osaka Univ. (Japan)
Kenta Ito, Toyama Prefectural Univ. (Japan)
Kigenn Sugahara, Toyama Prefectural Univ. (Japan)
Miki Kashiwakura, Osaka Univ. (Japan)
Tomoko G. Oyama, Japan Atomic Energy Agency (Japan)
Takahiro Kozawa, Osaka Univ. (Japan)
Seiichi Tagawa, Osaka Univ. (Japan)
Makoto Hanabata, Toyama Prefectural Univ. (Japan)


Published in SPIE Proceedings Vol. 9130:
Micro-Optics 2014
Hugo Thienpont; Jürgen Mohr; Hans Zappe; Hirochika Nakajima, Editor(s)

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