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Proceedings Paper

In cleanroom, sub-ppb real-time monitoring of volatile organic compounds using proton-transfer reaction/time of flight/mass spectrometry
Author(s): Nathalie Hayeck; Philippe Maillot; Thomas Vitrani; Nicolas Pic; Henri Wortham; Sasho Gligorovski; Brice Temime-Roussel; Aurélie Mizzi; Irène Poulet
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Paper Abstract

Refractory compounds such as Trimethylsilanol (TMS) and other organic compounds such as propylene glycol methyl ether acetate (PGMEA) used in the photolithography area of microelectronic cleanrooms have irreversible dramatic impact on optical lenses used on photolithography tools. There is a need for real-time, continuous measurements of organic contaminants in representative cleanroom environment especially in lithography zone. Such information is essential to properly evaluate the impact of organic contamination on optical lenses. In this study, a Proton-Transfer Reaction-Time-of-Flight Mass spectrometer (PTR-TOF-MS) was applied for real-time and continuous monitoring of fugitive organic contamination induced by the fabrication process. Three types of measurements were carried out using the PTR-TOF-MS in order to detect the volatile organic compounds (VOCs) next to the tools in the photolithography area and at the upstream and downstream of chemical filters used to purge the air in the cleanroom environment. A validation and verification of the results obtained with PTR-TOF-MS was performed by comparing these results with those obtained with an off-line technique that is Automated Thermal Desorber – Gas Chromatography – Mass Spectrometry (ATD-GC-MS) used as a reference analytical method. The emerged results from the PTR-TOF-MS analysis exhibited the temporal variation of the VOCs levels in the cleanroom environment during the fabrication process. While comparing the results emerging from the two techniques, a good agreement was found between the results obtained with PTR-TOF-MS and those obtained with ATD-GC-MS for the PGMEA, toluene and xylene. Regarding TMS, a significant difference was observed ascribed to the technical performance of both instruments.

Paper Details

Date Published: 2 April 2014
PDF: 11 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 905021 (2 April 2014); doi: 10.1117/12.2045579
Show Author Affiliations
Nathalie Hayeck, LCE, CNRS, Aix-Marseille Univ. (France)
TERA Environnement (France)
Philippe Maillot, STMicroelectronics (France)
Thomas Vitrani, STMicroelectronics (France)
Nicolas Pic, STMicroelectronics (France)
Henri Wortham, LCE, CNRS, Aix-Marseille Univ. (France)
Sasho Gligorovski, LCE, CNRS, Aix-Marseille Univ. (France)
Brice Temime-Roussel, LCE, CNRS, Aix-Marseille Univ. (France)
Aurélie Mizzi, LCE, CNRS, Aix-Marseille Univ. (France)
Irène Poulet, TERA Environnement (France)

Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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