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Proceedings Paper

Highly-efficient high-power pulsed CO2 laser characterized by transverse-flow laser amplifiers
Author(s): Yoichi Tanino; Jun-ichi Nishimae; Tatsuya Yamamoto; Taichiro Tamida; Koji Funaoka; Shuichi Fujikawa
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Paper Abstract

In this paper, we provide a detailed review of development of a highly-efficient high-power nanosecond pulse CO2 laser using transverse-flow radio-frequency (RF)-exited laser amplifiers, which is for extreme ultraviolet (EUV) light source of a next generation of nano-lithography. High-density excited high-power transverse-flow CO2 lasers were designed and built for the application of laser produced plasma (LPP) EUV source. We carried out an amplification test of the transverse-flow CO2 laser seeded by a nanosecond pulse CO2 laser. A four-amplifier system generated an average output power of 21 kW with an electrical input power of 400 kW for discharges. The electrical-to-optical efficiency was 5.2%. The input pulse laser had an average power of 46 W, the repetition rate was 100 kHz, and the pulse duration was 15 ns. The transverse-flow CO2 laser has strong points in high gain and availability of the multi-fold optical path. A highly-efficient amplification was experimentally proved characterized by transverse-flow CO2 laser amplifiers even with low-power seed. A transverse-flow CO2 laser is a promising candidate for an amplifier in the LPP EUV light source.

Paper Details

Date Published: 17 April 2014
PDF: 8 pages
Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90480E (17 April 2014); doi: 10.1117/12.2045566
Show Author Affiliations
Yoichi Tanino, Mitsubishi Electric Corp. (Japan)
Jun-ichi Nishimae, Mitsubishi Electric Corp. (Japan)
Tatsuya Yamamoto, Mitsubishi Electric Corp. (Japan)
Taichiro Tamida, Mitsubishi Electric Corp. (Japan)
Koji Funaoka, Mitsubishi Electric Corp. (Japan)
Shuichi Fujikawa, Mitsubishi Electric Corp. (Japan)


Published in SPIE Proceedings Vol. 9048:
Extreme Ultraviolet (EUV) Lithography V
Obert R. Wood; Eric M. Panning, Editor(s)

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