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Proceedings Paper

Estimating pattern sensitivity to the printing process for varying dose/focus conditions for RET development in the sub-22nm era
Author(s): Benoit Seguin; Henri Saab; Maria Gabrani; Virginia Estellers
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Paper Abstract

Evaluating pattern sensitivity to variability of the process parameters is of increasing importance to improve resolution enhancement techniques. In this paper, we propose an efficient algorithm to extract printed shapes from SEM images, a novel quality metric which analyzes the topology of the extracted printed shapes with respect to the target mask shape and a unique set of descriptors that define the sensitivity of a pattern. Compared to traditional CD methods, the proposed method has better accuracy, increased robustness and ability to spot global changes. Compared to contours distance methods, it is designed to expose most critical regions and capture context effects.

Paper Details

Date Published: 2 April 2014
PDF: 15 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90500P (2 April 2014); doi: 10.1117/12.2045463
Show Author Affiliations
Benoit Seguin, IBM Research – Zürich (Switzerland)
Henri Saab, IBM Research – Zürich (Switzerland)
Maria Gabrani, IBM Research – Zürich (Switzerland)
Virginia Estellers, Ecole Polytechnique Fédérale de Lausanne (Switzerland)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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