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Proceedings Paper

Study of lens heating behavior and thick mask effects with a computational method
Author(s): Ningning Jia; Seung-Hune Yang; Sangwook Kim; Jungdal Choi
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Paper Abstract

Advances on techniques that enable small technology nodes printing benefit the lithography with cost. For instance, lens heating draws people's attention when the NTD process is applied together with the bright tone mask. And the study of it requires the investigation of many other variables. In this paper we examine individual impact of several closely related process variables to understand the lens heating behavior. Meanwhile, though it is known that the PTD process is less sensitive to the lens heating effect, we do observe mask topography induced best focus shifts among different patterns with small spaces. It is of interest to discover the extent to which the NTD is affected. Thus in this paper we also compared the two processes with respect to the mask topography effect by simulating the best focus shifts of a series of test patterens.

Paper Details

Date Published: 31 March 2014
PDF: 10 pages
Proc. SPIE 9052, Optical Microlithography XXVII, 905209 (31 March 2014); doi: 10.1117/12.2045366
Show Author Affiliations
Ningning Jia, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seung-Hune Yang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sangwook Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jungdal Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9052:
Optical Microlithography XXVII
Kafai Lai; Andreas Erdmann, Editor(s)

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