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Proceedings Paper

Design of the phase-shifting algorithm for flatness measurement of a mask blank glass
Author(s): Yangjin Kim; Kenichi Hibino; Naohiko Sugita; Mamoru Mitsuishi
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Paper Abstract

Nonlinearity and non-uniformity of phase-shifts significantly contribute to the error of the evaluated phase in phase-shifting interferometry. However, state of the art error-compensating algorithms can counteract the linear mis-calibration and first-order nonlinearity associated with the phase-shift. We describe an error expansion method that is utilized to construct a phase-shifting algorithm that can compensate the second-order nonlinearity and non-uniformity of phase-shifts. The conditions for eliminating the effect of second-order nonlinearity and non-uniformity of phase-shifts are given as a set of linear equations for the sampling amplitudes. We developed a novel 11-sample phase-shifting algorithm that can compensate for the second-order nonlinearity and non-uniformity of phase-shifts and is robust up to a 4th harmonic. Experimental results show that the surface shape of a transparent plate could be measured with a precision of 1 nm, over the 120-mm-diameter aperture.

Paper Details

Date Published: 2 April 2014
PDF: 7 pages
Proc. SPIE 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII, 90501W (2 April 2014); doi: 10.1117/12.2045319
Show Author Affiliations
Yangjin Kim, The Univ. of Tokyo (Japan)
Kenichi Hibino, National Institute of Advanced Industrial Science and Technology (Japan)
Naohiko Sugita, The Univ. of Tokyo (Japan)
Mamoru Mitsuishi, The Univ. of Tokyo (Japan)


Published in SPIE Proceedings Vol. 9050:
Metrology, Inspection, and Process Control for Microlithography XXVIII
Jason P. Cain; Martha I. Sanchez, Editor(s)

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