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Proceedings Paper

Micro-optics fabrication by mask-based and mask-less mixed lithography process towards 3D optical circuits
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Paper Abstract

We utilized a hybrid lithography technique in the fabrication of a 45 degree micro mirror coupler to be used for a 3D optical circuit. The hybrid process combines traditional mask-based lithography techniques with mask-less methods. The result is a CMOS compatible process that can be used for fabrication of integrated micro-optics.

Paper Details

Date Published: 7 March 2014
PDF: 6 pages
Proc. SPIE 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII, 89740C (7 March 2014); doi: 10.1117/12.2045234
Show Author Affiliations
Chris Summitt, College of Optical Sciences, The Univ. of Arizona (United States)
Sunglin Wang, College of Optical Sciences, The Univ. of Arizona (United States)
Lee Johnson, College of Optical Sciences, The Univ. of Arizona (United States)
Melissa Zaverton, College of Optical Sciences, The Univ. of Arizona (United States)
Tao Ge, College of Optical Sciences, The Univ. of Arizona (United States)
Tom Milster, College of Optical Sciences, The Univ. of Arizona (United States)
Yuzuru Takashima, College of Optical Sciences, The Univ. of Arizona (United States)


Published in SPIE Proceedings Vol. 8974:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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