
Proceedings Paper
A new low-cost, thick-film metallization transfer process onto PDMS using a sacrificial copper seedFormat | Member Price | Non-Member Price |
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Paper Abstract
We present a new low cost microfabrication technology that utilizes a sacrificial conductive paint transfer method to
realize thick film copper microstructures that are embedded in polydimethylsiloxane (PDMS). This process has reduced
fabrication complexity and cost compared to existing metal-on-PDMS techniques, which enables large scale rapid
prototyping of designs using minimal laboratory equipment. This technology differs from others in its use of a
conductive copper paint seed layer and a unique transfer process that results in copper microstuctures embedded in
PDMS. By embedding microstructures flush with PDMS surface, rather than fabricating the microstructures on the
substrate surface, we produce a metallization layer that adheres to PDMS without the need for surface modifications.
The fabrication process begins with the deposition of the seed layer onto a flexible substrate via airbrushing. A dry film
photoresist layer is laminated on top and patterned using standard techniques. Electroplated copper is grown on the seed
layer through the photoresist mask and transferred to PDMS through a unique baking procedure. This baking transfer
process releases the electroplated copper from the seed layer, permanently embedding it into the cured PDMS without
cracking or otherwise deforming it. We have performed initial characterizations of the copper microstructures in terms of
feature size, film thickness, surface roughness, resistivity, and reliability under flexing. Initial results show that we can
achieve films 25-75 micrometers in thickness, with reliable feature sizes down to 100 micrometers and a film resistivity
of approximately 7.15 micro-Ω-cm. Process variants and future work are discussed, as well as large scale adaptations
and rapid prototyping. Finally, we outline the potential uses of this technology in flexible electronics, particularly in high
power applications.
Paper Details
Date Published: 16 April 2014
PDF: 15 pages
Proc. SPIE 9060, Nanosensors, Biosensors, and Info-Tech Sensors and Systems 2014, 906007 (16 April 2014); doi: 10.1117/12.2045228
Published in SPIE Proceedings Vol. 9060:
Nanosensors, Biosensors, and Info-Tech Sensors and Systems 2014
Vijay K. Varadan, Editor(s)
PDF: 15 pages
Proc. SPIE 9060, Nanosensors, Biosensors, and Info-Tech Sensors and Systems 2014, 906007 (16 April 2014); doi: 10.1117/12.2045228
Show Author Affiliations
Published in SPIE Proceedings Vol. 9060:
Nanosensors, Biosensors, and Info-Tech Sensors and Systems 2014
Vijay K. Varadan, Editor(s)
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