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Proceedings Paper

Novel fluorinated compounds that improve durability of antistick layer for quartz mold
Author(s): Tsuneo Yamashita; Hisashi Mitsuhashi; Masamichi Morita; Shuso Iyoshi; Makoto Okada; Shinji Matsui
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Paper Abstract

In recent years, the reduction in pattern size is driving the rapid adoption of nanoimprint lithography (NIL). Since nanoimprinting since is contact printing, a higher separation force might damage the master and/or the imprint tool, either of which degrades pattern quality. One of the biggest concerns in NIL utilization is the mold-release characteristic of the master and the resin. Although Optool DSXTM (DAIKIN Ind. Ltd.) is a de facto standard as mold release reagent, there is a problem with its UV-NIL durability. Accordingly, we focused on developing new fluorinated low molecular weight perfluorocompounds to enhance the mold-release characteristic of the resist. This paper reports that resists containing these fluroinated compounds offer improved durability as antistick layers for quartz molds subjected to repeated UV-NIL exposure.

Paper Details

Date Published: 28 March 2014
PDF: 7 pages
Proc. SPIE 9049, Alternative Lithographic Technologies VI, 90491Q (28 March 2014); doi: 10.1117/12.2044448
Show Author Affiliations
Tsuneo Yamashita, Daikin Industries, Ltd. (Japan)
Hisashi Mitsuhashi, Daikin Industries, Ltd. (Japan)
Masamichi Morita, Daikin Industries, Ltd. (Japan)
Shuso Iyoshi, Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Nanoimprint R&D Cen (Japan)
Makoto Okada, Univ. of Hyogo (Japan)
Shinji Matsui, Univ. of Hyogo (Japan)


Published in SPIE Proceedings Vol. 9049:
Alternative Lithographic Technologies VI
Douglas J. Resnick; Christopher Bencher, Editor(s)

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