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Proceedings Paper

Properties of dc-magnetron-sputtered NiSiOx films
Author(s): Joachim Szczyrbowski; Ralf Faber
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Paper Abstract

Transparent and durable thin films of NiSiO were prepared by reactive d.c. magnetron sputtering at room temperature. The target materials used were Si, Ni, NiSi2 and NiSi alloys with 20/80 and 40/60 wt % for nickel and silicon, respectively. With a suitable composition of Ar, N2 and 02 we were able to obtain a stable sputtering process for NiSiO-films without any arcing and flickering. The stable sputtering process formed non-absorbing layers with a deposition rate of 20 A/sec. This is approximately 2 to 3 times higher than the deposition rate for Si02 at the same deposition parameters. The optical transmission and reflection were measured in the wavelength region from 0.28 itm to 2.5 rim. The index of refraction n and the extinction coefficient k were calculated in the same range. The "theoretical" index of refraction was determined by Effective Medium Approximation (ENA).

Paper Details

Date Published: 1 August 1990
PDF: 8 pages
Proc. SPIE 1272, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion IX, (1 August 1990); doi: 10.1117/12.20430
Show Author Affiliations
Joachim Szczyrbowski, Leybold AG (Germany)
Ralf Faber, Leybold AG (Germany)


Published in SPIE Proceedings Vol. 1272:
Optical Materials Technology for Energy Efficiency and Solar Energy Conversion IX
Claes-Goeran Granqvist; Carl M. Lampert, Editor(s)

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