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Proceedings Paper

Application of atomic layer deposition in nanophotonics
Author(s): Lasse Karvonen; Antti Säynätjoki; Matthieu Roussey; Markku Kuittinen; Seppo Honkanen
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Paper Abstract

We review our recent results on using Atomic Layer Deposition (ALD) in fabrication of nanophotonic waveguide devices. ALD is a unique thin film deposition method providing atomic level control of film composition and thickness, perfect step coverage, and large-area uniformity. We employ the advantages of ALD in connection with Sinanophotonics. We present several new structures based on filling silicon slot waveguides or coating the silicon strip waveguides with ALD-grown materials. Also ALD grown TiO2 strip waveguides are introduced.

Paper Details

Date Published: 8 March 2014
PDF: 10 pages
Proc. SPIE 8988, Integrated Optics: Devices, Materials, and Technologies XVIII, 89880Z (8 March 2014); doi: 10.1117/12.2042263
Show Author Affiliations
Lasse Karvonen, Aalto Univ. (Finland)
Antti Säynätjoki, Aalto Univ. (Finland)
Matthieu Roussey, Univ. of Eastern Finland (Finland)
Markku Kuittinen, Univ. of Eastern Finland (Finland)
Seppo Honkanen, Univ. of Eastern Finland (Finland)


Published in SPIE Proceedings Vol. 8988:
Integrated Optics: Devices, Materials, and Technologies XVIII
Jean Emmanuel Broquin; Gualtiero Nunzi Conti, Editor(s)

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