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Proceedings Paper

Universal grating coupler design
Author(s): Yun Wang; Jonas Flueckiger; Charlie Lin; Lukas Chrostowski
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Paper Abstract

A universal design methodology for grating couplers based on the silicon-on-insultator platform is presented in this paper. Our design methodology accomodates various etch depths, silicon thickness (e.g., 220 nm, 300 nm), incident angles, and cladding materials (e.g., silicon oxide or air), and has been verified by simulations and measurement results. Further more, the design methodology presented can be applied to a wide range, from 1260 nm to 1675 nm, of wavelengths.

Paper Details

Date Published: 11 October 2013
PDF: 7 pages
Proc. SPIE 8915, Photonics North 2013, 89150Y (11 October 2013); doi: 10.1117/12.2042185
Show Author Affiliations
Yun Wang, The Univ. of British Columbia (Canada)
Jonas Flueckiger, The Univ. of British Columbia (Canada)
Charlie Lin, The Univ. of British Columbia (Canada)
Lukas Chrostowski, The Univ. of British Columbia (Canada)

Published in SPIE Proceedings Vol. 8915:
Photonics North 2013
Pavel Cheben; Jens Schmid; Caroline Boudoux; Lawrence R. Chen; André Delâge; Siegfried Janz; Raman Kashyap; David J. Lockwood; Hans-Peter Loock; Zetian Mi, Editor(s)

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