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Proceedings Paper

High-refractive-index gratings for spectroscopic and laser applications
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Paper Abstract

Fabrication of high performance gratings may significantly benefit from the use of high index materials such as Ta2O5, TiO 2 or Al2O3. However, these materials can typically not be patterned with the required quality by common etching processes. To overcome this limitation we developed novel grating fabrication technologies based on a combination of conventional lithography with Atomic-Layer-Deposition. For that the basic structure of the grating is first realized in a fused-silica substrate or a SiO2-layer. This template is then functionalized by an ALD-coating in a specific pre-defined manner. The new approach opens up a huge variety of new options for the realization of gratings whose fabrication would otherwise not be possible.

Paper Details

Date Published: 19 February 2014
PDF: 7 pages
Proc. SPIE 8995, High Contrast Metastructures III, 899504 (19 February 2014); doi: 10.1117/12.2041729
Show Author Affiliations
Uwe D. Zeitner, Friedrich-Schiller-Univ. Jena (Germany)
Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Frank Fuchs, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
E.-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)
Andreas Tünnermann, Friedrich-Schiller-Univ. Jena (Germany)
Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)


Published in SPIE Proceedings Vol. 8995:
High Contrast Metastructures III
Connie J. Chang-Hasnain; David Fattal; Fumio Koyama; Weimin Zhou, Editor(s)

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