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Proceedings Paper

Efficient fabrication of complex nano-optical structures by E-beam lithography based on character projection
Author(s): Uwe D. Zeitner; Torsten Harzendorf; Frank Fuchs; Michael Banasch; Holger Schmidt; Ernst-Bernhard Kley
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Paper Abstract

The fabrication of complex nano-optical structures for plasmonics, photonic-crystals, or meta-materials on application relevant areas by electron-beam lithography requires a highly parallel writing strategy. In case of periodic pattern as they are found in most of the mentioned optical elements this can be achieved by a so called character projection writing principle where complex exposure pattern are coded in a stencil mask and exposed with a single shot. Resulting shotcount and writing time reductions compared to standard Variable-Shaped-Beam exposures can be in the order of 100...10000. The limitation in flexibility by using hard-coded exposure shapes can be overcome by implementing the character projection principle with a highly precise motorized aperture stage capable of carrying several 1000 different apertures. Examples of nano-optical elements fabricated with the new character projection principle are presented.

Paper Details

Date Published: 7 March 2014
PDF: 6 pages
Proc. SPIE 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII, 89740G (7 March 2014); doi: 10.1117/12.2040206
Show Author Affiliations
Uwe D. Zeitner, Friedrich-Schiller-Univ. Jena (Germany)
Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Torsten Harzendorf, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Frank Fuchs, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)
Michael Banasch, Vistec Electron Beam GmbH (Germany)
Holger Schmidt, Friedrich-Schiller-Univ. Jena (Germany)
Ernst-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)


Published in SPIE Proceedings Vol. 8974:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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