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Proceedings Paper

Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform
Author(s): Matteo Cherchi; Sami Ylinen; Mikko Harjanne; Markku Kapulainen; Tapani Vehmas; Timo Aalto; George T. Kanellos; Dimitris Fitsios; Nikos Pleros
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Paper Abstract

We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 μm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.

Paper Details

Date Published: 8 March 2014
PDF: 7 pages
Proc. SPIE 8990, Silicon Photonics IX, 89900F (8 March 2014); doi: 10.1117/12.2039954
Show Author Affiliations
Matteo Cherchi, VTT Technical Research Ctr. of Finland (Finland)
Sami Ylinen, VTT Technical Research Ctr. of Finland (Finland)
Mikko Harjanne, VTT Technical Research Ctr. of Finland (Finland)
Markku Kapulainen, VTT Technical Research Ctr. of Finland (Finland)
Tapani Vehmas, VTT Technical Research Ctr. of Finland (Finland)
Timo Aalto, VTT Technical Research Ctr. of Finland (Finland)
George T. Kanellos, Ctr. for Research and Technology Hellas (Greece)
Dimitris Fitsios, Ctr. for Research and Technology Hellas (Greece)
Aristotle Univ. of Thessaloniki (Greece)
Nikos Pleros, Ctr. for Research and Technology Hellas (Greece)


Published in SPIE Proceedings Vol. 8990:
Silicon Photonics IX
Joel Kubby; Graham T. Reed, Editor(s)

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