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Proceedings Paper

Fabrication of SU-8 based nanopatterns and their use as a nanoimprint mold
Author(s): Junwei Su; Fan Gao; Zhiyong Gu; Wen Dai; George Cernigliaro; Hongwei Sun
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Paper Abstract

In this work, 3-D nanoscale line patterns were fabricated on SU-8 layers by Ga+ focused ion beam (FIB) lithography and used as Nanoimprint lithography (NIL) mold. Both V-shape side wall and opposing dose deficiency effect were observed and analyzed during the FIB milling process. Different beam currents were utilized to fabricate SU-8 pattern and it is found that the lower beam currents provide higher quality pattern with smooth edges and straight side walls. In addition, the impact of crosslink density of SU-8 material on the FIB milling efficiency was discussed. Both thermal and ultraviolet (UV) NIL were conducted using these line patterns to study the deformation of SU-8 mold and filling ratio of imprinting material. The experiments revealed that the imprint pressure and physic properties of imprinting material are the most critical factors in these NIL processes.

Paper Details

Date Published: 7 March 2014
PDF: 10 pages
Proc. SPIE 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII, 897409 (7 March 2014); doi: 10.1117/12.2039832
Show Author Affiliations
Junwei Su, Univ. of Massachusetts Lowell (United States)
Fan Gao, Univ. of Massachusetts Lowell (United States)
Zhiyong Gu, Univ. of Massachusetts Lowell (United States)
Wen Dai, MicroChem Corp. (United States)
George Cernigliaro, MicroChem Corp. (United States)
Hongwei Sun, Univ. of Massachusetts Lowell (United States)


Published in SPIE Proceedings Vol. 8974:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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