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Proceedings Paper

High-power UV from a thin-disk laser system
Author(s): S. M. Joosten; R. Busch; S. Marzenell; C. Ziolek; D. Sutter
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Paper Abstract

The demand for laser systems for marking and micromachining using high power UV has created a significant growth of lasers in manufacturing. To further support this growth advanced and cost-efficient technologies are required. Using a cavity dumped laser system based on thin disk technology leads to very short pulses below 10 ns. In addition the pulse width is independent of the chosen pulse repetition rate. This is in contrast to conventional Q-switched lasers. The combination of high average power and short pulses leads to high peak powers, e.g. more than 20 kW at 100 kHz. These short pulses are available even at high repetition rates up to 250 kHz and enable both high quality and high speed marking and micromachining. Using the field proven disk technology allows easy scaling to even higher power while maintaining reasonable costs. In this paper we will present a laser system based on the thin disk technology suitable for both micro machining and precise material processing.

Paper Details

Date Published: 28 February 2014
PDF: 5 pages
Proc. SPIE 8959, Solid State Lasers XXIII: Technology and Devices, 89590L (28 February 2014); doi: 10.1117/12.2039414
Show Author Affiliations
S. M. Joosten, TRUMPF Laser Marking Systems AG (Switzerland)
R. Busch, TRUMPF Laser Marking Systems AG (Switzerland)
S. Marzenell, TRUMPF Laser Marking Systems AG (Switzerland)
C. Ziolek, TRUMPF Laser Marking Systems AG (Switzerland)
D. Sutter, TRUMPF Laser GmbH & Co. KG (Germany)


Published in SPIE Proceedings Vol. 8959:
Solid State Lasers XXIII: Technology and Devices
W. Andrew Clarkson; Ramesh K. Shori, Editor(s)

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