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Proceedings Paper

Fabrication of photo responsive multi-bilayered film consisting of azobenzene containing copolymers and polyvinyl alcohol
Author(s): Ryohei Yagi; Yutaka Kuwahara; Hiroyuki Iwamoto; Sun-Nam Kim; Tomonari Ogata; Seiji Kurihara
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Paper Abstract

In this study, faster response speed of ON/OFF switching of multi-bilayered films containing azo-functionalized polymer liquid crystal and polyvinyl alcohol, PVA, is investigated. The multi-bilayered films were found to reflect a light of specific wavelength, and showed reversible change in the reflection intensity by irradiation with non-polarized visible light and UV light. The multi-bilayered film having high absorbance around 300-500 nm due to stacking several decades of azobenzene containing layer. So, the change in reflection intensity of multi-bilayered film takes long time by light irradiation. We synthesized polyacrylates copolymers with azobenzene and biphenyl side chains where biphenyl groups is having no absorbance at UV and visible region. Multi-bilayered films were fabricated by spin-coating method and the switching time of reflection was investigated comparing to the multi-bilayered film containing azobenzene homopolymer, the ON switching times of reflection for the copolymers were faster than homopolymer needing 900 s. It is attributed to that inducing UV light (λ = 365 nm) easily entered into the film by introducing of biphenyl groups.

Paper Details

Date Published: 19 February 2014
PDF: 7 pages
Proc. SPIE 9004, Emerging Liquid Crystal Technologies IX, 90040O (19 February 2014); doi: 10.1117/12.2038615
Show Author Affiliations
Ryohei Yagi, Kumamoto Univ. (Japan)
Yutaka Kuwahara, Kumamoto Univ. (Japan)
Kumamoto Institute for Photo-Electro Organics (Japan)
Hiroyuki Iwamoto, Kumamoto Univ. (Japan)
Sun-Nam Kim, Kumamoto Univ. (Japan)
Tomonari Ogata, Kumamoto Univ. (Japan)
Seiji Kurihara, Kumamoto Univ. (Japan)
Kumamoto Institute for Photo-Electro Organics (Japan)
JST-CREST (Japan)


Published in SPIE Proceedings Vol. 9004:
Emerging Liquid Crystal Technologies IX
Liang-Chy Chien; Antonio M. Figueiredo Neto; Kristiaan Neyts; Masanori Ozaki, Editor(s)

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