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Proceedings Paper

PLISD: a new high-vacuum sputtering technique for thin film deposition
Author(s): Liang Shi
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Paper Abstract

A new sputtering technique (PLISD: Pulsed-Laser Induced Sputtering Deposition) for thin film deposition is reported. Instead of the glow discharges of usual sputtering processes, PLISD uses a pulsed laser and an electrically conductive target for the generation of the bombarding ions. Its features and possible advantages are indicated, among which is the possibility to carry out sputtering deposition in a high-vacuum environment. Some preliminary experimental results are given which demonstrate the feasibility of the PLISD technique.

Paper Details

Date Published: 1 August 1990
PDF: 8 pages
Proc. SPIE 1270, Optical Thin Films and Applications, (1 August 1990); doi: 10.1117/12.20376
Show Author Affiliations
Liang Shi, B.V. Delft Electronische Producten (Netherlands)


Published in SPIE Proceedings Vol. 1270:
Optical Thin Films and Applications
Reinhard Herrmann, Editor(s)

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