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Proceedings Paper

Interference filters from molecular beam deposition
Author(s): Ian T. Muirhead; Christopher C.H. Hale; Shari Powell Fisher; John Gordon H. Mathew
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Paper Abstract

Trends in optical thin film interference filters have created an increasing demand for the production of high tolerance designs for a wide number of applications. Much has been achieved by conventional filter designs but more novel structures such as distributed Bragg filters (DBR) and rugates are of increasing interest. Such filters require a highly controlled deposition technology as many of the constituent layers are only a few tens of angstroms thick. At this previous conference (Hamburg 1988) the potential of molecular beam epitaxy (MBE) was discussed with reference to the manufacture of such demanding structures. Although MBE equipment is usually associated with the epitaxial growth of IIIV semiconductor material, the application has lead to the the availability of a wide range of ultra high vacuum (UHV) equipment suitable for the deposition of optical thin films. To date, considerable development has taken place with the commissioning of e Vacuum Generators V9OH production GaAs machine, adapted for optical thin film fabrication. This unit has a single 4" substrate capacity or multiples of smaller dimensions. Film thickness uniformity of better than +1- 0.5% have been routinely achieved over the maximum substrate area using a single rotation. Materials under current study include ZnSe, ZnS, BaF2 and PbF2. These offer candidate low and high index pairs from the UV to the IR region of the spectra and have been shown to be compatible for incorporation in a single chamber environment with minimal cross contamination. In this paper, current results will be presented from this unique deposition facility with particular emphasis on the gains made in depositing highly complex multilayer structures. An assessment will be given as to the potential of molecular beam deposition (MBD) as a production technique.

Paper Details

Date Published: 1 August 1990
PDF: 12 pages
Proc. SPIE 1270, Optical Thin Films and Applications, (1 August 1990); doi: 10.1117/12.20375
Show Author Affiliations
Ian T. Muirhead, OCLI Optical Coatings Ltd. (United Kingdom)
Christopher C.H. Hale, OCLI Optical Coatings Ltd. (United Kingdom)
Shari Powell Fisher, OCLI Optical Coatings Ltd. (United Kingdom)
John Gordon H. Mathew, Heriot Watt Univ. (United Kingdom)

Published in SPIE Proceedings Vol. 1270:
Optical Thin Films and Applications
Reinhard Herrmann, Editor(s)

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