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Proceedings Paper

Planar chalcogenide glass mid-infrared photonics
Author(s): Hongtao Lin; Lan Li; Yi Zou; Fei Deng; Chaoying Ni; Sylvain Danto; J. David Musgraves; Kathleen Richardson; Stephen T. Kozacik; Maciej Murakowski; Dennis Prather; Juejun Hu
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Paper Abstract

Chalcogenide glasses, namely the amorphous compounds containing sulfur, selenium, and/or tellurium, have emerged as a promising material candidate for mid-infrared integrated photonics given their wide optical transparency window, high linear and nonlinear indices, as well as their capacity for monolithic integration on a wide array of substrates. Exploiting these unique features of the material, we demonstrated high-index-contrast, waveguide-coupled As2Se3 chalcogenide glass resonators monolithically integrated on silicon with a high intrinsic quality factor of 2 × 105 at 5.2 micron wavelength, and what we believe to be the first waveguide photonic crystal cavity operating in the mid-infrared.

Paper Details

Date Published: 7 March 2014
PDF: 6 pages
Proc. SPIE 8974, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII, 89740D (7 March 2014); doi: 10.1117/12.2035688
Show Author Affiliations
Hongtao Lin, Univ. of Delaware (United States)
Lan Li, Univ. of Delaware (United States)
Yi Zou, Univ. of Delaware (United States)
Fei Deng, Univ. of Delaware (United States)
Chaoying Ni, Univ. of Delaware (United States)
Sylvain Danto, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)
J. David Musgraves, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)
Kathleen Richardson, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)
Stephen T. Kozacik, Univ. of Delaware (United States)
Maciej Murakowski, Univ. of Delaware (United States)
Dennis Prather, Univ. of Delaware (United States)
Juejun Hu, Univ. of Delaware (United States)


Published in SPIE Proceedings Vol. 8974:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf, Editor(s)

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