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Proceedings Paper

Development and measurement of single layer thickness standard
Author(s): Jianjun Cui; Sitian Gao; Hua Du; Xiaoping Zhu; Liping Yan
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Paper Abstract

To study the different measurement results come from different kinds of instruments for the thin film thickness measurement, a serial of the thin film thickness standard samples with single layer are developed, these thickness values are about from 5 nm to more than 100 nm. These standard samples designed specially can be calibrated by X- ray reflectometry, and also can be calibrated by some kinds of 3D surface profiler including some non-contact optical profilometers, stylus contact surface profilometers and scanning probe microscopies, because some specific film graphs are made in some zones on the layer. It is fund through some measure experiments comparison done that the film thickness measurement uncertainty is small than 1nm by X- ray reflectometry, and more than 2~10 nm by other measurement instruments. And then, to analyze the reasons for different measure methods have different values and uncertainties for the same layer thickness standard, such as the unperfected graphs influence of film thickness on the standard samples and the size and shape of probe tip for contact measure instrument, even including the difference of performance of the measure systems and computational approaches to the film thickness.

Paper Details

Date Published: 10 October 2013
PDF: 6 pages
Proc. SPIE 8916, Sixth International Symposium on Precision Mechanical Measurements, 891634 (10 October 2013); doi: 10.1117/12.2035503
Show Author Affiliations
Jianjun Cui, Tianjin Univ. (China)
National Institute of Metrology (China)
Sitian Gao, National Institute of Metrology (China)
Hua Du, National Institute of Metrology (China)
Xiaoping Zhu, National Institute of Metrology (China)
Liping Yan, Zhejiang Sci-Tech Univ. (China)


Published in SPIE Proceedings Vol. 8916:
Sixth International Symposium on Precision Mechanical Measurements
Shenghua Ye; Yetai Fei, Editor(s)

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